| 摘要 |
PROBLEM TO BE SOLVED: To enhance sputtering resistance of a protective film by arranging a magnesium oxide film of a 110 orientation. SOLUTION: An MgO film of a 110 orientation is formed as a protective film on a surface of a dielectric layer of PbO type low melting point glass of a plasma display panel. A glass substrate on which a sustained electrode and the dielectric layer are formed is fixed in an evaporation device chamber, and as one example, oxygen partial pressure is kept in 1×10<-4> Torr, and steam partial pressure is kept in a constant value, and evaporation is performed. Hydrogen gas and oxygen gas are introduced, and for example, the steam partial pressure is set in a range not more than 5×10<-4> Torr, and the 110 orientation is enhanced according to an increase in the steam partial pressure exceeding 1×10<-4> Torr. When the membrane of the MgO film formed into the dielectric layer is taken as 110 orientation, a membrane close to high density bulk is obtained, and sputtering resistance can be enhanced. |
