| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing a polymethacrylic resin item having an excellent impact resistance and good light diffusion properties. SOLUTION: 2-70 pts.wt. poly(meth)acrylic ester (co)polymer compsn. contg. 5-40wt.% poly(meth)acrylic ester (co)polymer having a wt.-average mol.wt. of 1,000-100,000 and methacryloyl groups at the molecular terminals is homogeneously mixed with 98-30 pts.wt. methyl methacrylate monomer compsn., and the resultant mixture is subjected to cast polymn. in the presence of a free- radical polymn. initiator. |
