| 摘要 |
PROBLEM TO BE SOLVED: To enable formation of electrical inter-connection between an outside layer and an inside layer, even when alignment is deviated by providing the second layer of a first material, which extends outside beyond the upper edge part of a contact-point opening part, inside the contact-point opening part up to the second thickness which is thicker than the first thickness, outside an etching stop layer. SOLUTION: A second layer 58 of a first material is stuck outside an etching stop layer 50 and inside a contact-point opening part 52, up to a second thickness. The second thickness forms the second layer 58 which extends outside beyond a contact-point opening part upper edge 56, thicker than the first thickness. Then, the first material of the second layer 58 is removed, and a plug 60 of the second layer of a first material is formed inside the contact-point opening part 52, and a mask pattern 64 which connects a base region 54 through the second layer plug 60 is formed. After that, parts of the etching stop layer, such parts as a first layer 48, and the second layer plug 60 which was not masked are etched. Thereby, conductive circuit parts such as a conductive line 66 connecting the base region 54 through the second layer 60 is constituted. |
