发明名称 |
METHOD FOR FABRICATING A PHOTOMASK |
摘要 |
The photo mask manufacturing method is composed of the step of (a) inputting selectively four dummy patterns(2) according to a field shape with priority given to a product die pattern(1) in an edge part; the step of (b) making a blind setting different according to the field shape in the photo mask where the dummy pattern(2) is input.
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申请公布号 |
KR0131263(B1) |
申请公布日期 |
1998.04.14 |
申请号 |
KR19940040772 |
申请日期 |
1994.12.30 |
申请人 |
HYUNDAI ELECTRONICS IND. CO.,LTD |
发明人 |
HWANG, JOON |
分类号 |
G03F1/42;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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