METHOD FOR FABRICATING A PHOTOMASK

摘要

The photo mask manufacturing method is composed of the step of (a) arranging a rectangular vernier of 5x5 micrometer in a predetermined interval in a diagonal direction with respect to X, Y axes to form a parent vernier(1); the step of (b) forming a child vernier(2) in a rectangular type of about 3x3 micrometer, then superposing it on the parent vernier in the same diagonal direction as the parent vernier; the step of (c) superposing the child vernier(2) on the parent vernier(1) of interior of a scribe lane to form a leading vernier of 1 row.