| 摘要 |
PROBLEM TO BE SOLVED: To provide a simple, efficient method for treating photoresist development waste liquid containing a photoresist and tetraalkyl ammonium ion by introducing a process in which the liquid is contacted with an anion exchanger. SOLUTION: Photoresist development waste liquid containing a photoresist and tetraalkyl ammonium ion, or the concentrated liquid mainly containing tetraalkyl ammonium ion (for example, the concentrated liquid by electrodialysis or electrolysis), or the neutralized liquid (obtained by neutralizing the development waste liquid and removing the insolubilized photoresist by filtration etc.) is contacted with an anion exchanger so that the photoresist is absorbed by the anion exchanger to be removed. In this method, the obtained treated liquid can be reused as a developer for the photoresist. |
