发明名称 |
Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups |
摘要 |
A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): <IMAGE> wherein R1, R2 and R3 are respectively a C1-C5 alkyl group or a C1-C5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C1-C3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
|
申请公布号 |
US5736292(A) |
申请公布日期 |
1998.04.07 |
申请号 |
US19950490511 |
申请日期 |
1995.06.14 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
IDA, AYAKO;OSAKI, HARUYOSHI;HIOKI, TAKESHI;DOI, YASUNORI;UETANI, YASUNORI;HANAWA, RYOTARO |
分类号 |
C07C39/15;G03F7/004;G03F7/022;G03F7/023;H01L21/027;H01L21/30;(IPC1-7):G03F7/023 |
主分类号 |
C07C39/15 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|