Elektrode zur Verwendung in Plasma-unterstützten chemischen Ätzprozessen,申请号DE19946004745T-传众专利搜索

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发明名称	Elektrode zur Verwendung in Plasma-unterstützten chemischen Ätzprozessen
摘要
申请公布号	DE69404745(T2)	申请公布日期	1998.03.19
申请号	DE19946004745T	申请日期	1994.05.12
申请人	IPEC PRECISION, INC., BETHEL, CONN., US	发明人	STEINBERG, GEORGE, WESTPORT, CT 06880, US
分类号	C23F4/00;H01J27/08;H01J37/08;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32	主分类号	C23F4/00
代理机构		代理人
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地址

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