| 摘要 |
At least one convex (or concave) arcuate face is formed by photolithography on a photoresist film formed on a surface of an optical device made of an optical material. The surface of the optical device and the photoresist film are etched to form, on the surface of the optical device, at least one convex (or concave) arcuate face similar to the convex (or concave) arcuate face formed on the photoresist film. After the surface of the optical material is mirror face polished, a photoresist film is formed on the polished surface, and the polished surface and the photoresist film are etched uniformly. An optical device obtained in this manner is used for a laser oscillator, a monolithic laser system, a nonlinear optical device, a microlens, a ring laser and so forth. Further, a plurality of reflecting portions are provided on a pair of opposing surfaces of a light transmitting optical material. At least one of the opposing surfaces is formed on the convex arcuate face. A zigzag optical path is formed between the reflecting portions of the opposing faces of the light transmitting optical material such that it couples the reflecting portions alternately to each other, thereby to obtain an optical device having a long optical path. The optical device is employed as a higher harmonic wave converting device, highly efficient for a short wavelength laser apparatus.
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