发明名称 Large aperture X-ray diffraction photograph production from reflex system
摘要 The apparatus for the production of X-ray diffraction photographs has an exciting electron beam between the objective lens of an electron gun and the sample. The beam is deflected magnetically or electrostatically so that the effective beam outlet cone, or opening angle, is considerably enlarged for the diffraction reflection. The electron beam is deflected magnetically using a coil system. The electron beam is deflected by a bent tube, which is electrostatically charged with negative polarity. The electron beam is deflected by a negatively charged electric mirror, or a negatively or a positively charged electrode.
申请公布号 DE19636613(A1) 申请公布日期 1998.03.12
申请号 DE19961036613 申请日期 1996.09.10
申请人 WUENSCHE, DIETMAR, DR.-ING., 01109 DRESDEN, DE 发明人 WUENSCHE, DIETMAR, DR.-ING., 01109 DRESDEN, DE
分类号 G01N23/225;G03B42/02;(IPC1-7):G03B42/02;G01N23/20 主分类号 G01N23/225
代理机构 代理人
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