| 摘要 |
PROBLEM TO BE SOLVED: To prevent fouling of piping by capturing fine particles and fogs of a solid organometallic raw material before moving to the outside of a hermetically sealed tank. SOLUTION: In this metal organic chemical vapor deposition apparatus provided with an organometallic gas feeding source 60, a first region 1 and a second region 2 hermetically separated is formed in a hermetically sealed tank 10 and the first region 1 is formed as a region for housing a solid organometallic raw material 31 and the second region 2 is formed as a region for accumulating fine particles and fogs blown up from the first region 1. |
