| 摘要 |
A projection exposure apparatus includes a secondary light source forming device having a light entrance surface and a light exit surface, for receiving light from a light source with the light entrance surface and for forming a secondary light source at the light exit surface side, a light projecting system for projecting light from the secondary light source to an object plane, a pattern projecting system for projecting, onto an image plane, a pattern on the object plane irradiated with the light, a secondary light source adjusting device for changing a light intensity distribution of the secondary light source, and an illuminance correcting device for substantially correcting illuminance non-uniformness, asymmetric with respect to an optical axis, formed or to be formed on the image plane with the change of the light intensity distribution.
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