PHOTOSENSITIVE MATERIAL PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive material processing device capable of uniformly applying a small amt. of processing liquid over the entire area of a photosensitive material. SOLUTION: A develop applying mechanism 43 has a developer supplying pipe 122 bored with plural discharge holes 121 below this mechanism, a developer receiving section 124 which is bored with plural apertures 123 in order to drop the developer supplied from this developer supplying pipe 122 at the bottom end thereof, a diffusion film 126 for guiding the developer dropped from the aperture 123 of the developer receiving section 124 to a coating roller 125 rotating in contact with a planographic printing plate M, a backflow preventive film 127 which comes into contact with the coating applying roller 125 and a back up roller 128 which comes into contact with the coating roller 125.