发明名称 ROTARY SUBSTRATE PROCESSOR APPARATUS
摘要 PROBLEM TO BE SOLVED: To reduce the size of the apparatus having chemical liq. processors and facilitate the maintenance, check and adjustment, by placing the processors along virtual circles and shifting dispensers mounted on rotatable support arms round the vertical axes at the centers of the virtual circles to the processors. SOLUTION: Two chemical liq. processors 2 are disposed so that their vertical axes P1 locate along virtual circles of specified radii. A chemical liq. feeder 3 for feeding chemical liqs. is disposed between the processors and has four dispensers for feeding mutually different chemical, liqs. and support arms 4 rotatable round the vertical axes P2 aligned with the centers of the vertical circles to mount and move the dispensers to feed positions above a substrate W and non-feed positions off from above the substrate, thereby selectively feeding desired chemical liq. to the substrate W.
申请公布号 JPH1064813(A) 申请公布日期 1998.03.06
申请号 JP19970099961 申请日期 1997.04.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KOYAMA YOSHIHIRO;MIZOHATA YASUHIRO;TSUJI MASAO;HISAI AKIHIRO;KODAMA MITSUMASA;MATSUNAGA SANENOBU;YAGI MASANOBU;NAKAMURA YASUSHI;SATO SEIYA;KOBAYASHI IPPEI
分类号 G03F7/16;G03F7/30;H01L21/027;H01L21/304;H01L21/306;(IPC1-7):H01L21/027 主分类号 G03F7/16
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