发明名称 On-site generation of ultra-high-purity buffered-HF for semiconductor processing
摘要 A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility (front end). Anhydrous ammonia is purified by scrubbing in a high-pH liquor, and then combined with high-purity aqueous HF which has been purified by a similar process. The generation is monitored by a density measurement to produce an acid whose pH and buffering are accurately controlled.
申请公布号 US5722442(A) 申请公布日期 1998.03.03
申请号 US19960674130 申请日期 1996.07.01
申请人 STARTEC VENTURES, INC. 发明人 HOFFMAN, JOE G.;CLARK, R. SCOT
分类号 C01B7/07;C01B7/19;C01C1/02;C01C1/16;H01L21/00;(IPC1-7):B08B3/10 主分类号 C01B7/07
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