发明名称 |
On-site generation of ultra-high-purity buffered-HF for semiconductor processing |
摘要 |
A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility (front end). Anhydrous ammonia is purified by scrubbing in a high-pH liquor, and then combined with high-purity aqueous HF which has been purified by a similar process. The generation is monitored by a density measurement to produce an acid whose pH and buffering are accurately controlled.
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申请公布号 |
US5722442(A) |
申请公布日期 |
1998.03.03 |
申请号 |
US19960674130 |
申请日期 |
1996.07.01 |
申请人 |
STARTEC VENTURES, INC. |
发明人 |
HOFFMAN, JOE G.;CLARK, R. SCOT |
分类号 |
C01B7/07;C01B7/19;C01C1/02;C01C1/16;H01L21/00;(IPC1-7):B08B3/10 |
主分类号 |
C01B7/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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