发明名称 INDUCTIVELY COUPLED PLASMA MASS ANALYZING DEVICE
摘要 PROBLEM TO BE SOLVED: To lower the detection limit for an object element to be measured, by reducing the size of an ion beam passing hole which divides an ion lens part and a mass selecting part, and lowering a vacuum degree, between a skimmer cone and an opening plate, by a gas introduced from a sampling cone. SOLUTION: The downstream side of the skimmer cone 34 of an ion lens part, and a mass selecting part on which a mass filter 52 is provided, are divided by an opening plate 104. A vacuum degree, between the skimmer cone 34 and the opening plate 104, is lowered by about 1×10<-3> Torr, by reducing the size of the ion beam passing hole 106 of the opening plate 104, and by gas (e.g. Ar) introduced from a sampling cone 32. Consequently, the number of ions related to argon such as ArCl, ArO, and Ar2 , infiltrating into the mass filter 52 side by the lowering of the vacuum degree, can be reduced, for lowering the detection limit of a object element to be measured such as Fe, As, and Se.
申请公布号 JPH1040857(A) 申请公布日期 1998.02.13
申请号 JP19960193355 申请日期 1996.07.23
申请人 YOKOGAWA ANALYTICAL SYST KK 发明人 SAKATA KENICHI;SAGAWA HITOSHI;YAMANAKA KAZUO
分类号 G01N27/62;H01J49/04;H01J49/10;H01J49/26;(IPC1-7):H01J49/26 主分类号 G01N27/62
代理机构 代理人
主权项
地址