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发明名称
Herstellverfahren für eine als Intermetalldielektrikum fungierende Isolatorschicht
摘要
申请公布号
DE19631743(A1)
申请公布日期
1998.02.12
申请号
DE19961031743
申请日期
1996.08.06
申请人
SIEMENS AG, 80333 MUENCHEN, DE;FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80636 MUENCHEN, DE
发明人
分类号
H01L21/316;H01L21/768;H01L23/522;(IPC1-7):H01L21/768
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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