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发明名称
Verfahren und Vorrichtung zur wiederholten Abbildung eines Maskermusters auf einem Substrat
摘要
申请公布号
DE69221340(T2)
申请公布日期
1998.02.12
申请号
DE19926021340T
申请日期
1992.01.30
申请人
ASM LITHOGRAPHY B.V., VELDHOVEN, NL
发明人
VAN DEN BRINK, MARINUS AART, NL-5656 AA EINDHOVEN, NL
分类号
G03F7/22;G03F7/20;G03F9/00;H01L21/027;H01L21/30;H01L21/68;(IPC1-7):G03F7/20
主分类号
G03F7/22
代理机构
代理人
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地址
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