发明名称 Verfahren zum Herstellen von wärmestrahlender Substraten zum Montieren von Halbleitern und gemäss diesem Verfahren hergestellte Halbleiterpackung
摘要 A method for manufacturing heat-radiative substrates on which semiconductor devices such as ICs and transistors are mounted and packages using the substrates, wherein a plurality of CuW or CuMo composite materials obtained by the infiltration method or the mixed powder sintering method are joined together with Cu interposed therebetween. Accordingly, the remaining empty holes within the CuW or CuMo materials are filled sufficiently with Cu, allowing high-quality packages having a successful thermal characteristic to be obtained. <IMAGE>
申请公布号 DE69128601(D1) 申请公布日期 1998.02.12
申请号 DE1991628601 申请日期 1991.10.15
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD., OSAKA, JP 发明人 OSADA, MITSUO, C/O ITAMI WORKS, ITAMI-SHI, HYOGO, JP;KOHMOTO, KENICHIRO, C/O ITAMI WORKS, ITAMI-SHI, HYOGO, JP
分类号 B22F5/00;B22F3/11;B22F7/08;H01L23/14;H01L23/373 主分类号 B22F5/00
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