NEGATIVE PHOTORESIST COMPOSITIONS AND USE THEREOF

摘要

Heat-resistant negative photoresist compositions which comprise a polyamic acid and a photosensitizer consisting of a specific 1,4-dihydropyridine derivative and which are not only excellent in both sensitivity and resolution but also easily developable with aqueous alkali. The compositions are characterized by comprising a polyamic acid and 1,4-dihydropyridine derivatives of general formula (I) wherein Ar is an aromatic group having a nitro group at the ortho position; R<1> is C1-C5 alkylene; and R<2>, R<3>, R<4> and R<5> are each hydrogen or C1-C4 alkyl.