发明名称 X-RAY MASK STRUCTURE, MANUFACTURING METHOD, X-RAY X-RAY MASK STRUCTURE, MANUFACTURING METHOD, X-RAY EXPOSURE METHOD USING SAME, AND DEVICE MANUFACTUREEXPOSURE METHOD USING SAME, AND DEVICE MANUFACTURED BY USING SAME D BY USING SAME
摘要 An X-ray mask structure has an X-ray absorber, an X-ray permeable film and a frame for supporting the X-ray permeable film, wherein the X-ray absorber is made of gold having crystal orientation such that with respect to the peak strength 1 of the (200) surface, the peak strength of the (111) surface is less than 0.5 in an X-ray diffraction test. A method of manufacturing X-ray mask structures includes the step of forming the X-ray absorber, in which after an X-ray absorbing film is formed on the X-ray permeable film, heating and cooling operations are repeated a plurality of times.
申请公布号 CA2079725(C) 申请公布日期 1998.02.03
申请号 CA19922079725 申请日期 1992.10.02
申请人 CANON KABUSHIKI KAISHA 发明人 IKEDA, TSUTOMU
分类号 C25D3/48;G03F1/14;G03F1/16;G03F1/22;H01L21/027;H01L21/302;H01L21/318;(IPC1-7):G03F1/08 主分类号 C25D3/48
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