发明名称 |
X-RAY MASK STRUCTURE, MANUFACTURING METHOD, X-RAY X-RAY MASK STRUCTURE, MANUFACTURING METHOD, X-RAY EXPOSURE METHOD USING SAME, AND DEVICE MANUFACTUREEXPOSURE METHOD USING SAME, AND DEVICE MANUFACTURED BY USING SAME D BY USING SAME |
摘要 |
An X-ray mask structure has an X-ray absorber, an X-ray permeable film and a frame for supporting the X-ray permeable film, wherein the X-ray absorber is made of gold having crystal orientation such that with respect to the peak strength 1 of the (200) surface, the peak strength of the (111) surface is less than 0.5 in an X-ray diffraction test. A method of manufacturing X-ray mask structures includes the step of forming the X-ray absorber, in which after an X-ray absorbing film is formed on the X-ray permeable film, heating and cooling operations are repeated a plurality of times. |
申请公布号 |
CA2079725(C) |
申请公布日期 |
1998.02.03 |
申请号 |
CA19922079725 |
申请日期 |
1992.10.02 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
IKEDA, TSUTOMU |
分类号 |
C25D3/48;G03F1/14;G03F1/16;G03F1/22;H01L21/027;H01L21/302;H01L21/318;(IPC1-7):G03F1/08 |
主分类号 |
C25D3/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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