发明名称 Particle monitor and particle-free processing system with particle monitor
摘要 <p>A particle monitor comprises a light source (11) for emitting a light ; a transmitter for transmitting the light into a space having particles over a wafer in a wafer processing system (12) to irradiate the light to the particles for causing a scattered light ; a photo-detector (13) for detecting the scattered light or luminance to generate output signals corresponding to the intensity of the scattered light ; a signal intensity judgment device (14) for receiving the output signals from the photo-detector (13) and comparing the output signals with a predetermined reference value already set in the signal intensity judgment device (14) so as to judge whether the intensity of the scattered light is higher or lower than the predetermined reference value ; and a display (15) for at least either displaying intensity of the scattered light and luminance and distributions in intensity thereof or displaying distributions in size and the number of particles. <IMAGE></p>
申请公布号 EP0821401(A2) 申请公布日期 1998.01.28
申请号 EP19970106990 申请日期 1997.04.28
申请人 NEC CORPORATION 发明人 UESUGI, FUMIHIKO;ITO, NATSUKO
分类号 G01N15/02;G01N15/14;G01N21/21;G01N21/47;G01N21/49;H01L21/66;(IPC1-7):H01L21/00;G01N21/88 主分类号 G01N15/02
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