| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject new compound suitable as a component of a chemical amplification positive resist material having high resolution and suitable for fine processing technology. SOLUTION: This new compound is a sulfonium salt expressed by the formula (R<1> is an alkyl, an alkoxy or a dialkylamino; OR<2> is an acidunstable group; Y is a 2-20C straight, branched or cyclic alkyl, an arylsulfonate, etc.; (n) is an integer of 0-2; (m) isaninteqer of 1-3; n+m is 3; (r) is an integer of 1-5; (p) is an integer of 0-5; (q) is an integer of 0-4; q+r is an integer of 1-5), having at least one acid-unstable group on the phenyl group in the molecule and having an alkyl or arylsulfonate group substituted with a straight, branched or cyclic electron-attracting group, e.g. 2,2,2-trifluoroethanesulfonic acid (4-tbutoxyphenyl) diphenylsulfonium salt. The compound forms a chemical amplification positive resist material together with an organic solvent, an alkali-soluble resin and an acid generating agent. |
