FORMATION OF SILICON DIOXIDE LAYER,申请号JP19960162175-传众专利搜索

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发明名称	FORMATION OF SILICON DIOXIDE LAYER
摘要
申请公布号	JPH108254(A)	申请公布日期	1998.01.13
申请号	JP19960162175	申请日期	1996.06.21
申请人	TOYOTA MOTOR CORP	发明人	MARUMOTO IKURO
分类号	C01B33/12;C23C16/40;C23C16/50;C23C16/503;C23C16/509;C23C26/00;(IPC1-7):C23C16/40	主分类号	C01B33/12
代理机构		代理人
主权项
地址

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