发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus enabling the reduction of particles with keeping the uniformity of the substrate processing. SOLUTION: Below a cup 3 a stage 8 is disposed with a mist separator 9 inserted between the stage 8 and exhaust hole 5 of the cup 3. A pipe 11 piercing the stage 8 is fitted to the separator 9 which is removably mounted on the stage 8 so as to be easily removed from the stage 8 by removing the cup 3. Pipes 17, 15, 14, 13, 11 connected between an exhaust hole 18 of the apparatus body and mist separator have inner diameters decreasing towards the cup 3. |
申请公布号 |
JPH104050(A) |
申请公布日期 |
1998.01.06 |
申请号 |
JP19960155584 |
申请日期 |
1996.06.17 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
OKUDA SEIICHIRO;SUGIMOTO KENJI |
分类号 |
G03F7/16;B05C11/08;B05D1/40;G03F7/30;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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