| 摘要 |
Robotic apparatus may be provided for handling workpieces such as semiconductor wafers within an integrated vacuum processing system and may be mounted within a vacuum load lock chamber adjacent a plurality of vacuum processing chambers. The apparatus includes an upper arm, a forearm, an end effector for supporting a wafer to be transported, and a wrist connecting the forearm to the end effector. The upper arm is rotatable in a level plane about an upright shoulder axis adjacent its inner end. A first coupling mechanism interconnects the forearm to the upper arm for mutual rotation about an elbow axis in a level plane. An end effector serves to support a wafer to be transported and a wrist connects the forearm to the end effector distant from the elbow axis. A second coupling mechanism interconnects the forearm to the wrist for their mutual rotation in a level plane about a wrist axis. Rotation of the upper arm moves the end effector between a retracted position and an extended position distant from the retracted position along a substantially straight line of travel and without change in its azimuthal orientation. |
