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发明名称
Verfahren zur Bildung einer Polycidschicht bei einem Halbleiterbauelement sowie das Halbleiterbauelement
摘要
申请公布号
DE19726308(A1)
申请公布日期
1998.01.02
申请号
DE19971026308
申请日期
1997.06.20
申请人
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD., ICHON, KYOUNGKI, KR
发明人
JUNG, SUNG HEE, SEOUL/SOUL, KR;KIM, CHUNG TAE, SEOUL/SOUL, KR
分类号
H01L21/28;H01L21/285;H01L21/3205;H01L23/52;(IPC1-7):H01L21/768;H01L21/283;H01L27/105
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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