发明名称 PLATE FOR WATERLESS LITHOGRAPHY
摘要 <p>A plate for waterless lithography comprising a substrate and, formed thereon in order, a photosensitive layer, an ink-repellent layer and a protective layer wherein the photosensitive layer contains a polymerizable compound obtained by reacting a glycidyl ether of a polyhydric alcohol such as hexitol or pentitol with acrylic acid and/or methacrylic acid. This plate is excellent in image reproducibility, storage stability and plate wear.</p>
申请公布号 WO1997049005(P1) 申请公布日期 1997.12.24
申请号 JP1997002085 申请日期 1997.06.17
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