| 摘要 |
<p>An exposure apparatus for exposing a pattern on a substrate to be exposed having a predetermined mark formed thereon includes a stage for supporting the substrate to be exposed thereon, moving means capable of moving the stage in a direction along a predetermined surface, mark detecting means for applying a light beam to the substrate to be exposed and detecting the predetermined mark, position detecting means outputting a position signal conforming to the position of the stage on the predetermined surface, producing means for detecting information regarding rotation of the stage along the predetermined surface and producing an information signal, and correcting means for correcting on the basis of the information signal the position signal when the mark detecting means detects the predetermined mark.</p> |
