发明名称 |
Method and device for preparing implant surfaces |
摘要 |
A method for preparing implant surfaces using gas discharge plasma including conveying the implants to a vacuum chamber. The implants are treated with an inert gas plasma to remove existing surface contamination and oxide layers from the implant surfaces. The implants are treated with an oxidizing plasma or by means of thermal oxidation to reoxidizing the implant surfaces. The implant treatment steps are carried out in a closed space, including a controlled atmosphere and produce a highly accurate and reproducible microstructure, composition, purity, and sterility in the implants.
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申请公布号 |
US5697997(A) |
申请公布日期 |
1997.12.16 |
申请号 |
US19960647284 |
申请日期 |
1996.05.09 |
申请人 |
NOBEL BIOCARE AB |
发明人 |
ARONSSON, BJOERN-OWE;JOHANSSON, PATRIK;KASEMO, BENGT;LAUSMAA, JUKKA |
分类号 |
A61C8/00;A61F2/00;A61F2/30;A61L2/14;A61L27/06;A61L27/10;B23K10/00;C23C8/10;C23C8/36;(IPC1-7):C03B32/00 |
主分类号 |
A61C8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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