SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To make it possible to suppress the increase in the size of the device and to surely replace the processing liquid of the rear surface of a substrate. SOLUTION: This substrate processing device is constituted to subject the substrate B to the prescribed processing by supplying the processing liquid to the front and rear surfaces of the substrate B under transportation in a posture inclined with a horizontal direction within the plane orthogonal with a substrate transporting direction. The device is provided with an auxiliary plate 7 which is arranged to face the rear surface side of the substrate B apart a prescribed spacing therefrom and a rear surface side processing liquid discharging means 6B which discharges the processing liquid toward the upper side end edge on the front surface side of this auxiliary plate 7. The width size of the auxiliary plate 7 is set longer than the width size of the substrate B and its upper side end edge is arranged in the position upper than the upper side end edge of the substrate B.