| 摘要 |
PROBLEM TO BE SOLVED: To easily form ultra fine pores at high precision and at low cost by applying a photosensitive resin to a mesh sheet or a porous sheet and carrying out metal plating in a pattern part at the time of exposure and development of the porous pattern. SOLUTION: A photosensitive resin 2 is applied to a mesh sheet or a porous sheet 1 and a pattern of a shadow mask is exposed and developed. The parts exposed to light become light transmissive parts 3a and the parts which are not radiated with light become light non transmissive parts 3b. In this case, the parts 3a are permeated with a developing liquid, so that no splashing occurs and both sides of each part 3a become vertical. Moreover, a metal plating layer 3c is formed in the parts 3b and in the case no mesh of the parts 3a is necessary, the parts 3a are removed by dissolution. In this way, a shadow mask 4 having a pattern can be formed. Not like a conventional way in which an etching liquid is sprayed to a costly metal plate to form ultra fine pores, a sheet 1 is used, so that formation of ultrafine pores can be easily carried out at extremely high precision and at low manufacturing cost. |
