| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resin composition which can give elaborate resistor, conductor, phosphor and diaphragm patterns for, e.g. a plasma display when they are developed and baked after exposure to ultraviolet rays by mixing a photopolymerizable resin with a metal powder, etc. SOLUTION: A photopolymerizable resin (A) is mixed with a non-reactive resin (A'), a diluent (B), a photopolymerization initiator (C), an ultraviolet absorber (D), a colorant (E), and a metal powder, a metal oxide or glass (F). Examples of component A include an aliphatic glycidyl ether (meth)acrylate described in Japanese Patent Laid-Open No.259528/1995 and a poly(meth)acrylate described in Japanese Patent Laid-open No.8-33099/1996. An example of component A' is polyethylene glycol polyester, and an example of component B is a reactive diluent or an organic solvent such as a half ester of a polycarboxylic acid anhydride. Examples of component F include Y2 O3 , Eu, YVO4 , Mn .Zn2 SiO4 , a copper powder, a silver powder and a glass powder having a particle diameter of 10μm or below. The obtained mixture is kneaded to obtain a resin composition for pattern formation, which is applied to various substrates to form patterns. |
