发明名称 |
Apparatus of formation of chemically amplified resist pattern |
摘要 |
A composition for negative type chemically amplified resist including, as main components, a random copolymer of vinyl phenol and vinyl cyclohexanol, a melamine resin having an enhanced hexamethoxymethylmelamine content, an acid generator for generating an acid upon irradiation by ionizing radiation, and a solvent. The resist pattern formation process and apparatus are also disclosed.
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申请公布号 |
US5693145(A) |
申请公布日期 |
1997.12.02 |
申请号 |
US19950468746 |
申请日期 |
1995.06.06 |
申请人 |
FUJITSU LIMITED |
发明人 |
OIKAWA, AKIRA;TANAKA, HIROYUKI;MATSUDA, HIDEYUKI |
分类号 |
G03F7/004;G03F7/038;G03F7/11;G03F7/16;(IPC1-7):C23C16/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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