发明名称 Verfahren zur Herstellung einer Halbleiterspeicheranordnung mit Kondensator
摘要 A semiconductor device comprises a capacitor consisting of an Al region formed on a semiconductor substrate, an Al oxide film formed on a surface of said Al region, and electrodes opposed to said Al region with interposition of said Al oxide film. The Al region can be grown selectively to produce freestanding mushroom-like structures without further pattering steps.
申请公布号 DE69126925(T2) 申请公布日期 1997.11.20
申请号 DE1991626925T 申请日期 1991.05.29
申请人 CANON K.K., TOKIO/TOKYO, JP 发明人 INOUE, SHUNSUKE, OHTA-KU, TOKYO, JP;SAKASHITA, YUKIHIKO, OHTA-KU, TOKYO, JP;NAKAMURA, YOSHIO, OHTA-KU, TOKYO, JP;KIKUCHI, SHIN, OHTA-KU, TOKYO, JP;YUZURIHARA, HIROSHI, OHTA-KU, TOKYO, JP
分类号 H01L27/108;(IPC1-7):H01L27/108;H01L21/824 主分类号 H01L27/108
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