发明名称 CONTINUOUS DIFFUSION TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a continuous diffusion treating apparatus which is capable of continuously treating, has a high treating ability, and does not repeat the temp. up and down to utilize the thermal energy without loss. SOLUTION: A tubular muffle 1 has open ends for entering and ejecting works and at least partly made of quartz. Heaters 2, 3 are disposed round the quartz-made part of the muffle 1 to form a adsorption heater E for adsorbing impurities on the work P and diffusion heater F or diffusing the adsorbed impurities in the work P. Impurity feed means 12 (13) are provided for feeding an impurity gas into the adsorption heater E. A gas exhaust pipe 14 is disposed at a part of the muffle, nearer to the inlet than this heater E. The work P is carried by a ceramic chain 16 to pass it through the muffle 1.
申请公布号 JPH09298163(A) 申请公布日期 1997.11.18
申请号 JP19960112237 申请日期 1996.05.07
申请人 KOYO RINDOBAAGU KK 发明人 KAJITA HIROSHI;TATSUMI MUTSUHIRO;TANAKA HISASHI
分类号 C30B31/16;H01L21/22;H01L21/677;H01L21/68;(IPC1-7):H01L21/22 主分类号 C30B31/16
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