发明名称 APPARATUS FOR HOLDING SUBSTRATE TO BE EXPOSED
摘要 <p>PROBLEM TO BE SOLVED: To correct the flatness of a substrate to be exposed on a holder, without increasing the cost of the apparatus. SOLUTION: An exposure light emitting end 10 for exposing a plate 7 is disposed above this plate to be laid on a plate holder 1. The lower end of this emitting end 10 is surrounded with a partition 6 and a nozzle 5 is mounted on the partition and connected to a compression air source 3 through a piping 4. At exposure, compressed air is jetted from the nozzle 5 in a space defined by the partition 6 to jet the compressed air from the lower end of the partition 6 on the plate 7, thereby pressing the plate 7 to the holder to correct the flatness of the plate 7 in the range surrounded by the partition 6.</p>
申请公布号 JPH09298144(A) 申请公布日期 1997.11.18
申请号 JP19960112253 申请日期 1996.05.07
申请人 NIKON CORP 发明人 TAKEMURA NORIYOSHI;NARAKI TAKESHI
分类号 G03F9/00;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/027 主分类号 G03F9/00
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