发明名称 |
Apparatus for detection of surface contaminations on silicon wafers |
摘要 |
Surface contamination of silicon wafers is detected by a combined beam-deflecting magnet and magnetic spectrometer system. Heavy ions are directed onto the surface of a silicon wafer through the beam-deflecting magnet, and ions back-scattered from contaminants in the surface of the wafer pass through the magnetic spectrometer onto a focal-plane detector. One or more Einzel lenses prevent ions back-scattered from the silicon in the wafer from reaching the detector.
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申请公布号 |
US5689112(A) |
申请公布日期 |
1997.11.18 |
申请号 |
US19960631059 |
申请日期 |
1996.04.12 |
申请人 |
ENGE, HARALD A.;LANFORD, WILLIAM A. |
发明人 |
ENGE, HARALD A.;LANFORD, WILLIAM A. |
分类号 |
H01J37/252;(IPC1-7):H01J49/44 |
主分类号 |
H01J37/252 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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