发明名称
摘要 PURPOSE:To easily form a pattern consisting of a conductive high polymer by applying a photopolymerizable compsn. which consists of a specific oxidation polymerizable monomer, photosensitizer and oxidizing agent on a substrate having an electrical conductivity, insulating characteristic, etc., and photopolymerizing said compsn. CONSTITUTION:The pattern consisting of the conductive high polymer is formed by applying the photopolymerizable compsn. consisting of the oxidation-polymerizable monomer which is capable of forming the conductive high polymer, the photosensitizer which consists of a dye having the oxidation potential higher than the oxidation potential of said monomer and the oxidizing agent which has the oxidation potential lower than the oxidation potential of said monomer on the substrate and photopolymerizing the compsn. The oxidation- polymerizable monomer which is capable of forming the conductive high polymer is exemplified by pyrrole and the deriv. thereof, thiophene and the deriv. thereof, aniline and deriv. thereof, as well as substd. arom. compds. having a high electron-donating property, for example, O<->, P<-> methoxybenzene, etc. The pattern of the conductive high polymer conforming to the pattern of irradiation light is thereby extremely easily formed. This method is useful for production of org. electronic materials, very large-scale integrated elements, molecule elements, etc.
申请公布号 JP2676515(B2) 申请公布日期 1997.11.17
申请号 JP19870280958 申请日期 1987.11.09
申请人 发明人
分类号 G03F7/00;C08G61/10;C08G61/12;G03C1/00;G03F7/004;G03F7/027;G03F7/029;H01B1/12;H01L21/28;H05K3/10;(IPC1-7):G03F7/004 主分类号 G03F7/00
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