发明名称 NAIL POLISH REMOVER COMPOSITION
摘要 Neil polish remover composition is composed of (a) 10-90wt% of solvents which can be dissolved in cellulose nitrate, (b) 0.1-40wt% of phthalates and lactic acid mytistils, (c) 0.011-5.0wt% of styrene acrylate copolymer and its derivatives and 0-50wt% of more than 1 species or 2 species of compound where distilled water, ethyl alcohol and oils are mixed. At normal temperature, the specific gravity of composition is ranged from 0.70 to 0.95. The composition prevents dehydrating and defatting in case of being used at a nail and has a mild flavor.
申请公布号 KR0122102(B1) 申请公布日期 1997.11.13
申请号 KR19940008696 申请日期 1994.04.25
申请人 PACIFIC CO.,LTD 发明人 YUN, PYUNG
分类号 A61K8/34;A61K8/33;A61Q3/04;(IPC1-7):A61K7/043 主分类号 A61K8/34
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