METHOD FOR HYDROPHILIZATION OF POLYSILICON SURFACE

摘要

A method for making hydrophile property surface of polyclinics comprising ; the step embodying wet oxide membrane etching using hydrogen fluoride; and the step quenching by using the solution in which H2O2 & NH4OH are added in water so as to remove residue generated on the surface of silicon of polyclinics; is disclosed. Said solution is the solution in which H2O2 over 0.1% and NH4OH over 0.1% are added in water. Thereby, it is possible to suppress the generation of the residue easily created on the surface of the polyclinics in wet etching the oxide membrane.