发明名称 EXHAUST GAS TREATING DEVICE AND CLEANING OF TREATING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To make the continuous operation of an exhaust treating device possible and to contrive the enhancement of the throughput of the device by a method wherein an adsorption cylinder is provided with a cooling means. SOLUTION: An exhaust gas treating device 20 consists of a dry gas treating device and has a first-step first treating part 22 and a second-step second treating part 23. The treating part 22 consists of an adsorption cylinder 24, which is a reaction tank to adsorb and remove the harmful component of the gas. The cylinder 24 is provided with a cooling means 27 for inhibiting or preventing a temperature rise or overheating of the cylinder 24 due to heat of reaction at the time of cleaning in the device 20. The means 27 is constituted of a cooling pipe (a cooling jacket) 28, which circulates a cooling medium, such as water or pure water, to exchange heat. The pipe 28 is provided on the outer peripheral part of the cylinder 24, but it may be provided also in the interior of the cylinder 24. Thereby, the enhancement of the adsorption power and safety of the device 20 is contrived, the continuous operation of the device becomes possible and the enhancement of the throughput of the device can be contrived.</p>
申请公布号 JPH09283510(A) 申请公布日期 1997.10.31
申请号 JP19960111330 申请日期 1996.04.08
申请人 TOKYO ELECTRON LTD 发明人 KAWAMURA GOHEI
分类号 B01D53/34;B01D53/68;B01D53/81;B01J20/18;C23C16/44;H01L21/205;H01L21/22;H01L21/31;H01L21/324;(IPC1-7):H01L21/31 主分类号 B01D53/34
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