发明名称 SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor laser and manufacturing method thereof which has a good window structure, high power and high quality. SOLUTION: A ZnSe layer is grown near the end face of a resonator e.g. at a growing temp. of 450 deg.C by the org. metal chemical vapor deposition method, using a Zn material e.g. dimethyl zinc (DMZn) and Se material e.g. dimethyl selenium (DMSe). As a mask does not exist near the resonator end face, ZnSe directly grows on a p-type GaAs contact layer 5 and Zn diffuses in a laser crystal but is blocked by the mask from diffusing in other part. The growing temp. of the ZnSe layer is set within a range of 400-550 deg.C. Finally the grown ZnSe is etched off, and e.g. Au/Ge/Ni/Au and T/Pt/Au are deposited to form an n-type and p-type electrodes 7 and 8, thus forming a semiconductor laser.
申请公布号 JPH09275241(A) 申请公布日期 1997.10.21
申请号 JP19960080016 申请日期 1996.04.02
申请人 SONY CORP 发明人 ASANO TAKEHARU
分类号 H01L33/06;H01L33/14;H01L33/28;H01L33/30;H01L33/40;H01S5/00 主分类号 H01L33/06
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