| 摘要 |
<p>PROBLEM TO BE SOLVED: To form a pattern with high efficiency by forming the pattern by means of pattern exposure in a consecutive irradiation state while consecutively feeding a film-like base material where photosensitive resist film is formed. SOLUTION: The base material 1 is fed from a feeding reel at fixed speed and opposed to a mask for exposure 8 at an exposure part. An endless belt 9 is set just above the mask 8 and moves strictly synchronizing with the carrying speed and direction and the parallelism of the base material 1. The belt 9 is made of a metallic thin plate having peripheral length equal to the repetitive cycle of the mask pattern or the integral multiple thereof, and the pattern part is an aperture part in a state where only the outline part of a stripe pattern to be formed is left. A light source 10 and a reflection mirror 15 are positioned in space inside the belt 9, and ultraviolet light is consecutively generated. The coloring stripe pattern is exposed on the resist film of the base material 1 at the exposure part.</p> |
