发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To effectively use a clean room by vertically laminating a treatment area in which substrate processing parts are arranged and a carriage area wherein a substrate carrying means carries the substrate, and reducing the installation sectional area of equipment. SOLUTION: An equipment 1 has a three floors structure. An accommodation area is arranged on the first floor part, a carriage area 12 is arranged on the second floor part, a processing area 13 is arranged on the third floor, and the carriage area 12 and the processing area 13 are vertically laminated. The carriage area 12 is made an area which is used for carrying a substrate carrying equipment 10 to a board W in the equipment 1, and an aperture 14 through which the substrate carrying equipment 10 carries the substrate W between the carriage area 12 and the processing area 13 is formed in a ceiling part. The processing area 13 is made an area which is used for arranging substrate processing parts such as a thermal treatment part 3, a spin coater 4, a spin developer 5, an edge exposure part 6. Thereby the sectional area of the equipment can be reduced, and a clean room can be effectively used.
申请公布号 JPH09275127(A) 申请公布日期 1997.10.21
申请号 JP19960104728 申请日期 1996.04.01
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SUGIMOTO KENJI
分类号 H01L21/677;H01L21/02;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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