Vorrichtung zur Kathodenzerstäubung

摘要

A cathodic sputtering device produces layers on a substrate (27) by means of a sputtering cathode (2) which may be introduced into a vacuum chamber, which is rotationally symmetrical with respect to the middle axis (44) of the sputtering cathode (2) and whose surface (41) is at least partially slanted with respect to the target rear side (40). A target surface (41) which slants with respect to the target rear side (74) or at least part of said surface defines an angle with the target rear side (74). The target surface (41) lies between other target surfaces (76, 78) which also define an angle SIGMA , mu , alpha with the slanting target surface (41).