发明名称 |
Semiconductor wafer apparatus with integrated circuit forming region |
摘要 |
<p>The apparatus has a region which forms an integrated circuit (1a) with a first contact or bond island (2). A separating section (6) is located round the forming region which separates individual integrated circuits as chips. On the separating section is provided a second contact island (3). The two contact islands are electrically interconnected by a coupler (7) with a bend on the forming region for the integrated circuits. Preferably the surface of the second contact island is greater than that of the first one.</p> |
申请公布号 |
DE19645568(A1) |
申请公布日期 |
1997.09.25 |
申请号 |
DE1996145568 |
申请日期 |
1996.11.05 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP |
发明人 |
NAKAMURA, KAZUKO, TOKIO/TOKYO, JP |
分类号 |
H01L21/66;H01L21/301;H01L21/60;H01L21/78;H01L23/485;(IPC1-7):H01L27/04;H01L21/76 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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