发明名称 Semiconductor wafer apparatus with integrated circuit forming region
摘要 <p>The apparatus has a region which forms an integrated circuit (1a) with a first contact or bond island (2). A separating section (6) is located round the forming region which separates individual integrated circuits as chips. On the separating section is provided a second contact island (3). The two contact islands are electrically interconnected by a coupler (7) with a bend on the forming region for the integrated circuits. Preferably the surface of the second contact island is greater than that of the first one.</p>
申请公布号 DE19645568(A1) 申请公布日期 1997.09.25
申请号 DE1996145568 申请日期 1996.11.05
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP 发明人 NAKAMURA, KAZUKO, TOKIO/TOKYO, JP
分类号 H01L21/66;H01L21/301;H01L21/60;H01L21/78;H01L23/485;(IPC1-7):H01L27/04;H01L21/76 主分类号 H01L21/66
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