| 摘要 |
The present invention provides methods and apparatuses for polishing hard discs, which polish discs evenly, which dispose of frictional electricity between discs and polishing materials, and which prevent the discs from frictionally heated deformation. A turntable for putting disc thereon is freely rotatable. A polishing material rotates horizontally and polishes the surface of the disc by contacting to its surface. The turntable relatively slides against the surface of the polishing material. A spindle of the polishing material slightly inclines toward the center of the turntable from a vertical axis of the disc. The turntable is rotated in opposite direction to the rotating direction of the disc by the friction between disc and polishing material. The disc is essentially grounded. <IMAGE> |
