| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device for liquid crystals characterized by a small size, lightweightness, low cost, high resolution and wide field. SOLUTION: A front stage MLA(microlens array) 10 is arranged behind a mask 1 recorded with patterns to be transferred to a wafer 2, by which inverted and unmagnified pattern images 3 are formed at every area rotated by 180 deg.C with each arranging area of this front stage MLA 10. A rear stage MLA 15 consisting of the same arrangement as the arrangement of the front stage (microlens array) 10 is arranged behind these inverted and unmagnified pattern images 3 of every area, by which erecting unmagnified images 4 of partial patterns are formed on the wafer 2. The mask 1 and the wafer 2 as well as the front stage and rear stage MLAs 10, 15 are scanned relatively toward the row direction x of the patterns 1a, by which the patterns 1a are transferred onto the wafer 2. |
