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发明名称
Verfahren zur Herstellung einer CMOS-Halbleitervorrichtung
摘要
申请公布号
DE19516423(C2)
申请公布日期
1997.09.11
申请号
DE19951016423
申请日期
1995.05.04
申请人
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD., ICHON, KYOUNGKI, KR
发明人
KIM, JAE KAP, ICHON, KYUNGKI, KR
分类号
H01L21/8238;H01L27/092;(IPC1-7):H01L21/823
主分类号
H01L21/8238
代理机构
代理人
主权项
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